FFKM O-Ring Seals for Semiconductor Manufacturing | Perfluoroelastomer High-Purity Materials
XHH Seals offers FFKM O-Ring Seals. Made from PFR 5920M, these materials are designed for ultra-high purity, extreme chemical resistance, and plasma durability, making them ideal for the most demanding sealing applications in the semiconductor, pharmaceutical, and specialty chemical industries.
PFR 5920M is a nano-filled perfluoroelastomer developed by Solvay, offering outstanding resistance to oxygen, fluorine, plasma, acids, solvents, and high temperatures.
Key Features
- Ultra-Pure Composition: Manufactured using ultra-clean FFKM compounds (e.g., PFR 5920M), with extremely low metal ion and particle contamination.
- Outstanding Plasma Resistance: Withstands aggressive plasma gases including O₂, CF₄, NF₃, ClF₃, making it ideal for dry etching and ashing chambers.
- Broad Chemical Compatibility: Resistant to strong acids, bases, amines, solvents, and oxidizers used in semiconductor and photovoltaic processes.
- High Temperature Stability: Operating range from –10 °C to +270 °C, with short-term exposure up to 320 °C.
- Low Outgassing & Particle Shedding: Ensures process integrity in vacuum and cleanroom environments.
- Precision Surface Finish: Smooth sealing surfaces minimize dead space and fluid entrapment.
- Compression Set Resistance: Maintains sealing performance through thermal cycling.
Typical Applications in the Semiconductor Industry
- Plasma Etch Chambers (Dry Etch, RIE, ICP, etc.)
- CVD / PECVD / ALD Equipment
- Wet Bench Processing
- Spin Coaters / Developers
- Load Locks and Transfer Modules
- CMP and Post-Clean Modules
- Gas Boxes and Valves
Customization
Material: FFKM (Perfluoroelastomer), e.g., Tecnoflon® PFR 5920M, Kalrez® equivalent available on request
OEM-Compatible: Can replace Kalrez®, Chemraz®, Simriz® in many semiconductor sealing
Size Range: 202.79 x 3.53mm,Standard AS568, JIS B2401,Metric, or Fully Custom